MIT 6.774 Physics of Microfabrication: Front End Processing, Fall 2004

by MIT OpenCourseWare · 21 videos

Total watch time

1d 1h 4m

at speed · exactly 1 day, 1 hour, 3 minutes, 32 seconds at 1×

1d 1h 3m 32s
1.25×20h 2m 50s
1.5×16h 42m 21s
1.75×14h 19m 10s
12h 31m 46s
Average video1h 11m 36s
Longest1h 18m 49s
Shortest1h
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Videos (21)

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Watched
1 3. Crystal Growth, Wafer Fabrication, and Basic Properties of Si Wafers (cont.) 1:00:36 2024-06-26
2 4. Wafer Cleaning and Gettering (cont.) 1:11:30 2024-06-26
3 5. Wafer Cleaning and Gettering - Contamination Measurement Techniques 1:16:00 2024-06-26
4 6. Oxidation and the Si/SiO2 Interface. Deal/Grove Model, Thin Oxide Models 1:13:37 2024-06-26
5 7. Oxidation and the Si/SiO2 Interface. 2D Effects, Doping Effects, Point Defect 1:11:08 2024-06-26
6 8. Dopant Diffusion - Need for Abrupt Profiles, Fick's Laws, Simple Analytic 1:02:52 2024-06-26
7 9. Dopant Diffusion - Numerical Techniques in Diffusion, E Field Effects 1:00:43 2024-06-26
8 10. Dopant Diffusion - Fermi Level Effects, I and V Assisted Diffusion 1:18:39 2024-06-26
9 11. Dopant Diffusion - Review Atomic Scale Models, Profile Measurement Techniques 1:16:02 2024-06-26
10 12. Ion Implantation and Annealing - Analytic Models and Monte Carlo 1:16:38 2024-06-26
11 13. Ion Implantation and Annealing - Physics of E Loss, Damage, Introduction to TED 1:11:49 2024-06-26
12 14. Transient Enhanced Diffusion (TED) - +1 Model, (311) Defects and TED Introduction 1:16:51 2024-06-26
13 15. Transient Enhanced Diffusion (TED) - Simulation Examples, TED Calculations, RSCE in detail 1:00:00 2024-06-26
14 16. The SUPREM IV Process Simulator 1:14:08 2024-06-26
15 17. Thin Film Deposition and Epitaxy - Introduction to CVD, Si Epitaxial Growth 1:10:00 2024-06-26
16 18. Thin Film Deposition and Epitaxy - CVD Examples and PVD 1:12:27 2024-06-26
17 19. Thin Film Deposition and Epitaxy - Modeling Topography of Deposition 1:12:15 2024-06-26
18 20. Etching - Introduction 1:14:36 2024-06-26
19 21. Etching - Poly Gate Etching, Stringers, Modeling of Etching 1:12:08 2024-06-26
20 22. Silicides, Device Contacts, Novel Gate Materials 1:18:49 2024-06-26
21 23. Growth and Processing of Strained Si/SiGe and Stress Effects on Devices 1:12:44 2024-06-26

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